PEO-604 Semiconductor Furnace

PEO-604 Key Features

Small footprint wafer furnace for up to 200mm diameter wafersUp to 100 programmable process steps & unlimited process recipesEnergy saving by zero energy consumption at ambient / standbyMultiple processes by easily exchangeable quartz In-LinersExcellent ramping rates, up to 1000°C in less than 15 minutes< 1ppm Oxygen with 2 times vacuum-N2-backfill routine

ATV's PEO-604 is a 230mm diameter quartz tube, where the process tube, thermal insulation and heaters are enclosed within an N2 purged and interlocked enclosure, to enable processing of hazardous and flammable materials. In addition to standard oxidation, annealing, diffusion processes etc., the system is capable of processing pyrophoric or highly flammable gases, precursor materials or even toxic gases.

System can process wafers up to 200mm in diameter, with a flat zone within the furnace for up to 50 wafers (temperature uniformity +/- 1.5°C, over 150mm batch). Furnace body is hermetically sealed providing < 1 ppm Oxygen contact with 2 x vacuum N2 back fill routines. Windows based process recipe generation and management system: 100steps per recipe, Step length 1s - 99:59min, process data logging, several user levels, Barcode management and a PLC Controller.

Designed for volume production through wall installation is possible while still retaining easy to access service hatches for preventative and routine maintenance. The PEO 604 has low energy and gas consumption with zero energy loss at Ambient Standby.

The systems are high quality, reliable production tools capable of continuous operation and rapid switching between a variety of complex processes without contamination using the novel "in-liner" principle.

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PEO-604 Technical Downloads

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ATV PEO Furnace Model Range Datasheet

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