Manual Wafer Hot Plate

HP8 Manual Wafer Hot Plate Key Features

Small Footprint Manual Wafer Hot PlateFor up to 200mm Wafers and Substrates250°C Maximum TemperatureProgrammable Heating Ramp in 1s steps Excellent Uniformity: � 1% (� 0.5% < 120°C)N2 Purge, Lift Pins, Proximity BakeStand Alone, Table Top or Bench MountedProtection Coating of Hot Plate Surface Touchscreen Operation

The HP8 manual wafer hot plate for up to 200mm wafers/substrates has been designed to meet the requirements of R&D work and small scale production and is available in bench mounted, table-top or stand-alone versions.

The hot plate is equipped with lift pins as a standard, which permits convenient and safe substrate handling. Nitrogen purge and vacuum suction of the substrate can also be individually selected for each step in the recipe editor.

The closed double walled lid ensures stable process conditions and prevents accidental touching of the hot surface by the operator.

In addition, the HP8 offers homogeneous temperature distribution by utilising special heating coils, as well as heating ramps with high repeating accuracy, to ensure constant and stable process results. The manual hotplate is an ideal companion tool for any lithographic production or research environment and is widely used in processing of the photo-resists and polymers at all fabrication levels.

SUSS also manufacture a the LabSpin range of high-performance manual resist spin coat and puddle develop tools.

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SÜSS MicroTec HP8 Hot Plate

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