Magnetic Stimulation Wafer Probing System

PS4L-MSS Key Features

Magnetic Stimulation Wafer ProbingGenerate a controlled magnetic stimulation during testingVariable position of the magnetic source to the device under testIntegrate thermal test during stimulationTest individual die, partial wafer through 200 mm wafers Extensive range of options and featuresBuilt on the modular and field upgrade-able PS4L PlatformCustomized according to users exact probing requirements

The PS4L-MSS Magnetic Stimulation Wafer Probing System is designed to enable researchers the ability to probe devices with the addition of a moveable Magnetic Stimulation source under the DUT (within 3 mm) and to control the location of that magnetic source in X, Y, Z and theta.

The system has been developed to provide the optimum control of every aspect of your magnetic stimulation wafer probe test. In order to gain the minimum distance from the DUT to the magnetic source, an ultra-thin glass chuck is used. The wafer or fragment is held in position using two non ferric clamps. The chuck system is located on the top of a stage with independent X, Y, Z and theta control. It is open directly under the chuck for the magnetic source and magnetic source positioning system. The chuck plate has a built-in planarization system.

The MSS system is designed to use standard DC probes on individual manipulators, probe cards, probing wedges or HF/Microwave probes. The number of probes and overdrive of the probes is limited due to the thin glass chuck used to hold the sample. Manipulators are held in place using magnetic, vacuum or bolt down bases. Bolt down bases provide the most strength and rigidity.

The magnetic source is held on a unique holder designed to provide a rigid mount that maintains multiple degrees of freedom for positioning in relationship to the DUT. Because the cooling lines and power lines come from under the magnetic source, the holder has an open bay to accommodate this wiring. Directly beneath the magnet holder, a Z unit provides 25 mm (1") of vertical adjustment to allow the magnetic source to be moved with precision into close proximity of the bottom of the chuck. Typically, the magnetic source can be moved within 4 to 5 ?m of the bottom of the DUT. This structure is mounted onto an X-Y stage attached to the base of the probing system. An adjustable arm allows for gross adjustment of the Z position for the magnet system to allow for magnetic sources of different heights. Because the magnet is located within the vertical supports for the chuck system, the magnet has X, Y, Z and theta position control.

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Magnetic Stimulation Wafer Probing System Downloads

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