HMxSquare Photo-mask Cleaner

HMxSquare Key Features

Semiautomatic Photo Mask cleaning systemManual load with automatic sequential processing SEMI Certified and qualified for >1?m technology nodesHigh up-time and low Cost of Ownership Mask / substrate clean, develop, etch & stripFor pieces up to either 9" or 14" Masks & 3-14" square substratesAdvanced safety featuresSmall footprint and lost cost of ownership

The HMxSquare photo mask cleaner from SUSS MicroTec, is available in two models:

HMx9 - For cleaning up to 9" Masks, 50-200 mm diameter wafers, 3-9 inch square substrates and pieces

HMx14 - For cleaning up to 14" Chrome and chrome oxide photomask, 100-300mm wafers and 5-14 square substrates (other on request).

With a
minimal cleanroom footprint, the systems are SEMI S2, S8, S13 compliant and
designed for high-quality mask or substrate cleaning and the mask fabrication
develop, clean and etch processes in the 3 µm - 250 nm technology nodes.

The HMxSquare is manually loaded with automatic sequential processing. With worldwide reference sites the systems combine stability and reliability to provide optimum results and a low cost of ownership.

The equipment is designed to comply with the latest environmental and safety regulations and is available with full-jet spray nozzle dispense with pre-heated media, front-side and back-side rinse, integrated acid-chemical storage, automatic chemical refill, brush, megasonic or binary spray and interchangeable chucks etc.

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SÜSS MicroTec HMxSquare Photomask Equipment

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